Lab Facilities
Description of lab use and procedures.
| Leo Microscope |
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The Leo 440 Scanning Electron Microscope has a tungsten filament electron source. Feature sizes of 50nm can be resolved with this machine. There is an e-beam lithography setup for pattern generation of 80 by 80 microns. For more information contact Matt DeLong, 581-7462 or Randy Polson, 581-7001. |
| FEI Microscope |
| The FEI NanoNova Scanning Electron Microscope is a field emitter electron source. Feature sizes of 2nm can be resolved. There is a low vacuum feature which allows imaging of non-conducting samples. An x-ray elemental analysis system is attached to allow identification of elements within a sample. For more information contact Matt DeLong, 581-7462 or Randy Polson, 581-7001. |
 The AlphaSNOM uses an extremely precise capacitively-controlled piezo platform to scan the sample in three dimensions. The stage is used not only in SNOM and AFM, but also in confocal mode. Therefore, it is possible to analyze the same sample area with different techniques and combine the benefits of all three modes.By simply rotating the objective turret, the user can choose from among Confocal Microscopy, Scanning Near-Field Optical Microscope or Atomic Force Microscope. For scanning near-field optical microscopy, the AlphaSNOM uses unique micro-fabricated Cantilever SNOM Sensors, that significantly outperform standard fiber optical probes in resolution, transmission, ease of operation and reliability. Please contact Jordan Gerton if you have any additional questions about this machine. |
The Raman lab has several dedicated lasers and spectrometers for spectroscopy. There is an argon ion laser with discrete visible wavelengths from 457 to 514 nm, a krypton laser with wavelengths 646 and 674nm, and a tunable titanium sapphire laser from 750 to 850nm. There is a triple monochromator useful for low wavenumber shifts with a liquid nitrogen cooled CCD detector. There is a 0.85m double monochromator with a PMT a photon counter for high resolution spectroscopy. For more information contact Randy Polson, 581-7001. |
| The picolab has a modelocked picosecond laser that seeds a regenerative amplifier. The nd:yag based system has a fundamental wavelength of 1064nm and pulse duration of 100ps. This can be frequency doubled to 532nm and frequency tripled to 355nm. The modelocked laser has an average power of 600mW at 532nm and an 76 MHz repetition rate for an energy of about 8 nanojoules per pulse. The regenerative amplifer has an average power of 10mW and repetition rate of 1000 Hz for an energy per pulse of 10 microjoules. For more information contact Randy Polson, 581-7001. |
| The femtosecond lab has a modelocked femtosecond laser that seeds a regenerative amplifer. The titanium:sapphire based mode locked laser operates at 800nm and produces 100fs pulses at 800nm. The average power is 300mW which give an energy of 3.8 nanojoules per pulse. The regenerative amplifer produces an average power of 300mW at a repetition rate of 1000Hz for a pulse energy of 0.3milijoules. Second and third harmonics at 400nm and 266nm are available. Additionally, there is a Optical Parametric Amplifier (OPA) which can give a continuous tuning range of 1.3micron to 1.5 micron. For more information contact Randy Polson, 581-7001. |